Details
ISBN/EAN: 978-3-7091-1666-1
Einband: kartoniertes Buch
Weitere Details
Auflage:
1. Auflage 2014
1. Auflage 2014
Erschienen am:
28.01.2014
28.01.2014
Sprache:
English
English
Umfang:
viii, 344 S., 176 s/w Illustr., 76 farbige Illustr
viii, 344 S., 176 s/w Illustr., 76 farbige Illustr
Hersteller:
Springer Verlag GmbH
juergen.hartmann@springer.com
Tiergartenstr. 17
DE 69121 Heidelberg
Springer Verlag GmbH
juergen.hartmann@springer.com
Tiergartenstr. 17
DE 69121 Heidelberg
Weitere Details
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160,49 €
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Lieferbar innerhalb 1 - 2 Wochen
Beschreibung
Intended to update scientists and engineers on the current state of the art in a variety of key techniques used extensively in the fabrication of structures at the nanoscale. The present work covers the essential technologies for creating sub 25 nm features lithographically, depositing layers with nanometer control, and etching patterns and structures at the nanoscale. A distinguishing feature of this book is a focus not on extension of microelectronics fabrication, but rather on techniques applicable for building NEMS, biosensors, nanomaterials, photonic crystals, and other novel devices and structures that will revolutionize society in the coming years.